Rapid Thermal Processor

Surface Science Integration Solaris 100

Manufacture: Surface Science Integration Solaris 100

The Solaris 100 is a manually loaded system capable of processing silicon, III-V and other substrates up to 100 mm in diameter. The system is equipped with recipe management, system diagnostics, and user-friendly interface for operator productivity.


  • Excellent repeatability by use of state-of-the-art thermocouple signal conditioning.
  • Operating Temperature Range RT – 1250 Degrees Celsius
  • Gas Delivery system is capable of up to 4 Mass Flow controllers.
  • Wafer Capability: 1" to 4". Sample holders are available.
  • Semiconductor grade quartz process chamber
  • 13 Tungsten halogen lamps in an upper/lower array
  • High Accuracy K-Type thermocouple control
  • High Purity Quartz Wafer Tray
  • MFC Controlled Gas Lines
  • Three Zone Temperature control for optimized uniformity
  • Steady State Temperature Range: Ambient–1200ºC
  • Steady State Process time: 0.1 sec to unlimited time
  • Temperature Uniformity: +/- 2ºC across 75mm wafer
  • Wafer diameter sizes: small pieces to 100mm
  • GUI Software with Graphing and Data Logging Capabilities
  • Up to four Mass Flow Controllers for process gases


Baylor Research and Innovation Collaborative

100 Research Pkwy
Waco, TX 76704

(254) 710-6778

(254) 710-4665