Manufacture: Plasma Etch Plasma Cleaning System PE-50
- 400W 50KHz Continuously Variable Power Supply with Automatic Matching Network
- PLC-Based Keypad Input System
- Single 4.5”W x 6”D horizontal “Direct Contact” RF powered electrode with approximately 2” chamber height clearance.
- 150 Watt, 50 kHz Continuously Variable RF Power Supply.
- 5 CFM 2-Stage Direct Drive Oil Vacuum Pump, Oxygen Service (Krytox Charged).
- 2 Rotometers, 2 Gas Controls, 0–25cc/min w/precision needle valves.
- Pirani Vacuum Gauge, 1–2000 mT