Oxygen Plasma

Oxygen Plasma - Plasma Etch Plasma Cleaning System PE-50

Manufacture: Plasma Etch Plasma Cleaning System PE-50


  • 400W 50KHz Continuously Variable Power Supply with Automatic Matching Network
  • PLC-Based Keypad Input System
  • Single 4.5”W x 6”D horizontal “Direct Contact” RF powered electrode with approximately 2” chamber height clearance.
  • 150 Watt, 50 kHz Continuously Variable RF Power Supply.
  • 5 CFM 2-Stage Direct Drive Oil Vacuum Pump, Oxygen Service (Krytox Charged).
  • 2 Rotometers, 2 Gas Controls, 0–25cc/min w/precision needle valves.  
  • Pirani Vacuum Gauge, 1–2000 mT


Baylor Research and Innovation Collaborative

100 Research Pkwy
Waco, TX 76704

(254) 710-6778

(254) 710-4665