Electron Beam Lithography

Baylor's Raith Voyager-Electron Beam Lithography

Manufacture: Raith Voyager

  • < 10 nm line width 
  • Beam energy from 10 keV to 50 keV
  • Electrostatic deflection (single stage, thus no subfields)
  • Thermal field emission electron source technology
  • ~50 pA to ~40 nA beam current
  • Flexible, adjustable beam current and reproducible presets, due to a 2x condensor zoom lens configuration
  • Writefield size: up to 500 μm at 50 kV (2400 μm at 10 kV)
  • High-speed 50 MHz pattern generator
  • Laser-interferometer controlled stage with 150 x 150 mm travel range
  • Samples with an 8-inch diameter or 7-inch square can be loaded (see options list for various dedicated holders)
  • Dry vacuum system with automatic 8-inch load lock

BRIC

Baylor Research and Innovation Collaborative

100 Research Pkwy
Waco, TX 76704

(254) 710-6778

(254) 710-4665